JPH0135492B2 - - Google Patents

Info

Publication number
JPH0135492B2
JPH0135492B2 JP54061371A JP6137179A JPH0135492B2 JP H0135492 B2 JPH0135492 B2 JP H0135492B2 JP 54061371 A JP54061371 A JP 54061371A JP 6137179 A JP6137179 A JP 6137179A JP H0135492 B2 JPH0135492 B2 JP H0135492B2
Authority
JP
Japan
Prior art keywords
wafer
line
adjustment
mask
lines
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54061371A
Other languages
English (en)
Japanese (ja)
Other versions
JPS54152975A (en
Inventor
Deemensu Gyuntaa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens Corp
Original Assignee
Siemens Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Corp filed Critical Siemens Corp
Publication of JPS54152975A publication Critical patent/JPS54152975A/ja
Publication of JPH0135492B2 publication Critical patent/JPH0135492B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7092—Signal processing

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP6137179A 1978-05-22 1979-05-18 Method of and device for automatically coinciding Granted JPS54152975A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19782822269 DE2822269C2 (de) 1978-05-22 1978-05-22 Verfahren zur automatischen Ausrichtung von zwei aufeinander einzujustierenden Objekten

Publications (2)

Publication Number Publication Date
JPS54152975A JPS54152975A (en) 1979-12-01
JPH0135492B2 true JPH0135492B2 (en]) 1989-07-25

Family

ID=6039934

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6137179A Granted JPS54152975A (en) 1978-05-22 1979-05-18 Method of and device for automatically coinciding

Country Status (2)

Country Link
JP (1) JPS54152975A (en])
DE (1) DE2822269C2 (en])

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2846316A1 (de) * 1978-10-24 1980-06-04 Siemens Ag Verfahren und vorrichtung zur automatischen ausrichtung von zwei aufeinander einzujustierenden objekten
US4687980A (en) * 1980-10-20 1987-08-18 Eaton Corporation X-Y addressable workpiece positioner and mask aligner using same
US4977361A (en) * 1978-06-26 1990-12-11 Eaton Corporation X-Y addressable workpiece positioner and mask aligner using same
DE2942990A1 (de) * 1979-10-24 1981-05-07 Siemens AG, 1000 Berlin und 8000 München Verfahren zur automatischen justierung von strukturen in zwei parallelen ebenen, insbesondere bei der herstellung von integrierten halbleiterschaltungen
EP0036026B1 (de) * 1980-03-10 1986-11-12 Eaton-Optimetrix Inc. Adressierbare Positioniervorrichtung
JPS5972134A (ja) * 1982-10-18 1984-04-24 Hitachi Ltd パタ−ン検出装置
JPH0666241B2 (ja) * 1985-10-14 1994-08-24 株式会社日立製作所 位置検出方法
DE3911357A1 (de) * 1989-04-07 1990-10-18 Nokia Unterhaltungselektronik Verfahren zum gegenseitigen justieren zweier bauteile einer anzeigeeinrichtung
DE4000785A1 (de) * 1990-01-12 1991-07-18 Suess Kg Karl Justiermarken fuer zwei aufeinander einzujustierende objekte
JPH03232215A (ja) * 1990-02-08 1991-10-16 Toshiba Corp 位置合せ方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1919991C3 (de) * 1969-04-19 1973-11-29 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Anordnung zur automatischen Aus richtung von zwei aufeinander einzu justierenden Objekten
US3796497A (en) * 1971-12-01 1974-03-12 Ibm Optical alignment method and apparatus
JPS5729045B2 (en]) * 1974-12-27 1982-06-21
JPS51120178A (en) * 1975-04-14 1976-10-21 Nippon Telegr & Teleph Corp <Ntt> Scanning type mask detector
JPS51140488A (en) * 1975-05-30 1976-12-03 Hitachi Ltd Mask alignment device
JPS5235995A (en) * 1975-09-16 1977-03-18 Yoshinao Aoki Electromagnetic wave image method

Also Published As

Publication number Publication date
DE2822269C2 (de) 1983-12-01
DE2822269A1 (de) 1979-11-29
JPS54152975A (en) 1979-12-01

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